HFinFET: A Scalable, High Performance, Low Leakage Hybrid N-Channel FET

Details HFinFET: A Scalable, High Performance, Low Leakage Hybrid N-Channel FET HFinFET: A Scalable, High Performance, Low Leakage Hybrid N-Channel FET

2010-03-27

arxiv.org/abs/1003.5291v1

IEEE Transactions on Nanotechnology, Vol. 9, No. 3, pp. 342-344, 2010

Physics

Condensed Matter

Mesoscale and Nanoscale Physics

3 pages, 4 figures

Scientific paper

In this letter we propose the design and simulation study of a novel transistor, called HFinFET, which is a hybrid of a HEMT and a FinFET, to obtain excellent performance and good off state control. Followed by the description of the design, 3D device simulation has been performed to predict the characteristics of the device. The device has been benchmarked against published state of the art HEMT as well as planar and non-planar Si NMOSFET data of comparable gate length using standard benchmarking techniques.

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