Growth of high quality large area MgB2 thin films by reactive evaporation

Details Growth of high quality large area MgB2 thin films by reactive evaporation Growth of high quality large area MgB2 thin films by reactive evaporation

2006-01-30

arxiv.org/abs/cond-mat/0601669v1

Physics

Condensed Matter

Superconductivity

Submitted to Superconductor Science and Technology

Scientific paper

10.1088/0953-2048/19/6/L02

We report a new in-situ reactive deposition thin film growth technique for the production of MgB2 thin films which offers several advantages over all existing methods and is the first deposition method to enable the production of high-quality MgB2 films for real-world applications. We have used this growth method, which incorporates a rotating pocket heater, to deposit MgB2 films on a variety of substrates, including single-crystalline, polycrystalline, metallic, and semiconductor materials up to 4" in diameter. This technique allows growth of double-sided, large-area films in the intermediate temperature range of 400 to 600 degrees C. These films are clean, well-connected, and consistently display Tc values of 38 to 39 K with low resistivity and residual resistivity values. They are also robust and uncommonly stable upon exposure to atmosphere and water.

Affiliated with

Also associated with

No associations

Rating

Growth of high quality large area MgB2 thin films by reactive evaporation does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with Growth of high quality large area MgB2 thin films by reactive evaporation, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Growth of high quality large area MgB2 thin films by reactive evaporation will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFWR-SCP-O-14804