Growth model with restricted surface relaxation

Details Growth model with restricted surface relaxation Growth model with restricted surface relaxation

2002-07-25

arxiv.org/abs/cond-mat/0207614v1

Physics

Condensed Matter

Statistical Mechanics

Scientific paper

10.1103/PhysRevE.66.061604

We simulate a growth model with restricted surface relaxation process in d=1 and d=2, where d is the dimensionality of a flat substrate. In this model, each particle can relax on the surface to a local minimum, as the Edwards-Wilkinson linear model, but only within a distance s. If the local minimum is out from this distance, the particle evaporates through a refuse mechanism similar to the Kim-Kosterlitz nonlinear model. In d=1, the growth exponent beta, measured from the temporal behavior of roughness, indicates that in the coarse-grained limit, the linear term of the Kardar-Parisi-Zhang equation dominates in short times (low-roughness) and, in asymptotic times, the nonlinear term prevails. The crossover between linear and nonlinear behaviors occurs in a characteristic time t_c which only depends on the magnitude of the parameter s, related to the nonlinear term. In d=2, we find indications of a similar crossover, that is, logarithmic temporal behavior of roughness in short times and power law behavior in asymptotic times.

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