Frustration of the interlayer coupling by mobile holes in La2-xSrxCuO4 (x<0.02)

Details Frustration of the interlayer coupling by mobile holes in La2-xSrxCuO4 (x<0.02) Frustration of the interlayer coupling by mobile holes in La2-xSrxCuO4 (x<0.02)

2002-10-17

arxiv.org/abs/cond-mat/0210357v1

Phys. Rev. B 70, 220507(R) (2004)

Physics

Condensed Matter

Strongly Correlated Electrons

4 pages, 4 figures

Scientific paper

10.1103/PhysRevB.70.220507

We have studied the interlayer coupling in the antiferromagnetic (AF) phase of Sr and Zn doped La2CuO4 by analyzing the spin flip transition in the magnetization curves. We find that the interlayer coupling strongly depends on the mobility of the hole charge carriers. Samples with the same hole content as well as the same Neel temperature but a different hole mobility, which we adjusted by Zn co-doping, can have a very different interlayer coupling. Our results suggest that only mobile holes can cause a strong frustration of the interlayer coupling.

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