Focused-ion-beam milling based nanostencil mask fabrication for spin transfer torque studies

Details Focused-ion-beam milling based nanostencil mask fabrication for spin transfer torque studies Focused-ion-beam milling based nanostencil mask fabrication for spin transfer torque studies

2005-12-13

arxiv.org/abs/cond-mat/0512283v1

Physics

Condensed Matter

Mesoscale and Nanoscale Physics

13 pages, 3 figures, submitted to APL

Scientific paper

Focused-ion-beam milling is used to fabricate nanostencil masks suitable for the fabrication of magnetic nanostructures relevant for spin transfer torque studies. Nanostencil masks are used to define the device dimensions prior to the growth of the thin film stack. They consist of a wet etch resistant top layer and an insulator on top of a pre-patterned bottom electrode. The insulator supports a hard mask and gives rise to an undercut by its selective etching. The approach is demonstrated by fabricating current perpendicular to the plane Co/Cu/Co nanopillar junctions, which exhibit current-induced magnetization dynamics.

Affiliated with

Also associated with

No associations

Rating

Focused-ion-beam milling based nanostencil mask fabrication for spin transfer torque studies does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with Focused-ion-beam milling based nanostencil mask fabrication for spin transfer torque studies, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Focused-ion-beam milling based nanostencil mask fabrication for spin transfer torque studies will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFWR-SCP-O-36158