Fabrication of Nano-Scale Gaps in Integrated Circuits

Details Fabrication of Nano-Scale Gaps in Integrated Circuits Fabrication of Nano-Scale Gaps in Integrated Circuits

2002-04-14

arxiv.org/abs/cond-mat/0204304v1

Applied Physics Letters 81,pages 730-732 (2002)

Physics

Condensed Matter

Mesoscale and Nanoscale Physics

4 pages, 3 figures

Scientific paper

10.1063/1.1495080

Nano-size objects like metal clusters present an ideal system for the study of quantum phenomena and for constructing practical quantum devices. Integrating these small objects in a macroscopic circuit is, however, a difficult task. So far the nanoparticles have been contacted and addressed by highly sophisticated techniques which are not suitable for large scale integration in macroscopic circuits. We present an optical lithography method that allows for the fabrication of a network of electrodes which are separated by gaps of controlled nanometer size. The main idea is to control the gap size with subnanometer precision using a structure grown by molecular beam epitaxy.

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