Evolution of topological order in Xe films on a quasicrystal surface

Details Evolution of topological order in Xe films on a quasicrystal surface Evolution of topological order in Xe films on a quasicrystal surface

2005-02-18

arxiv.org/abs/cond-mat/0502466v1

Phys. Rev. Lett. 95, 136104 (2005)

Physics

Condensed Matter

Materials Science

Scientific paper

10.1103/PhysRevLett.95.136104

We report results of the first computer simulation studies of a physically adsorbed gas on a quasicrystalline surface, Xe on decagonal Al-Ni-Co. The grand canonical Monte Carlo method is employed, using a semi-empirical gas-surface interaction, based on conventional combining rules, and the usual Lennard-Jones Xe-Xe interaction. The resulting adsorption isotherms and calculated structures are consistent with the results of LEED experimental data. The evolution of the bulk film begins in the second layer, while the low coverage behavior is epitaxial. This transition from 5-fold to 6-fold ordering is temperature dependent, occurring earlier (at lower coverage) for the higher temperatures.

Affiliated with

Also associated with

No associations

Rating

Evolution of topological order in Xe films on a quasicrystal surface does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with Evolution of topological order in Xe films on a quasicrystal surface, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Evolution of topological order in Xe films on a quasicrystal surface will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFWR-SCP-O-387809