Epitaxial growth under oblique incidence

Details Epitaxial growth under oblique incidence Epitaxial growth under oblique incidence

2008-09-18

arxiv.org/abs/0809.3147v1

Physics

Condensed Matter

Materials Science

4 pages,4 figures

Scientific paper

A continuum one dimensional model of homoepitaxial growth under oblique incidence is investigated. We carried out numerical integration of a continuum equation incorporating a shadowing search algorithm. The interplay between the Ehrlich-Schwoebel (ES) effect and shadowing is clearly highlighted. It was found that different growth phases are separated by a well defined crossover time after which the ES and shadowing are the dominating mechanisms. Also, the model identified the existence of a transition period where deep grooves develop on the surface before the shadowing regime is fully developed. We found that growth under oblique angles accelerates the coarsening of mounds on the surface and we determined the corresponding critical exponent.

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