Effect of Plasma Irradiation on $Cd I_2$ films

Details Effect of Plasma Irradiation on $Cd I_2$ films Effect of Plasma Irradiation on $Cd I_2$ films

2004-08-04

arxiv.org/abs/cond-mat/0408092v1

J. Appl. Phys., 95, 7725-30 (2004)

Physics

Condensed Matter

Materials Science

13 pages and 10 fig

Scientific paper

10.1063/1.1738538

The effect of plasma irradiation is studied systematically on a 4H polytype (002) oriented ${\rm CdI_2}$ stoichiometric film having compressive residual stress. Plasma irradiation was found to change the orientation to (110) of the film at certain moderate irradiation distances. A linear decrease in grain size and residual stress was observed with decreasing irradiation distance (or increasing ion energy) consistent with both structural and morphological observations. The direct optical energy gap ${\rm E_g}$ was found to increase linearly at the rate ${\rm 15\mu eV/atm}$ with the compressive stress. The combined data of present compressive stress and from earlier reported tensile stress show a consistent trend of ${\rm E_g}$ change with stress. The iodine-iodine distance in the unit cell could be responsible for the observed change in ${\rm E_g}$ with stress.

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