ECR Plasma assisted deposition of zinc nanowires

Details ECR Plasma assisted deposition of zinc nanowires ECR Plasma assisted deposition of zinc nanowires

2006-10-09

arxiv.org/abs/cond-mat/0610216v2

Physics

Condensed Matter

Materials Science

19 pages 5 figures, full paper sumitted to thin solid films

Scientific paper

Deposits of one-dimensional nanostructures of zinc with diameters of 90-120 nm have been obtained by means of sputtering in an Electron Cyclotron Resonance (ECR) plasma reactor. The sputtering has been made effective by using a negatively biased cylindrical target in a hollow cathode geometry. The nanocrystalline films deposited on the glass substrate were studied with scanning tunneling microscopy/spectroscopy and was found to consist of nanowires having metallic nature. The crystalline nature of these metallic nanowires was studied with x-ray diffraction analysis.

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