Dynamics of Particle Deposition on a Disordered Substrate: I. Near- Equilibrium Behavior

Details Dynamics of Particle Deposition on a Disordered Substrate: I. Near- Equilibrium Behavior Dynamics of Particle Deposition on a Disordered Substrate: I. Near- Equilibrium Behavior

1994-09-06

arxiv.org/abs/cond-mat/9409021v1

Physics

Condensed Matter

35 pages + 7 figs in uucompressed file. UR-CM 94-0902

Scientific paper

10.1103/PhysRevE.50.3546

A growth model which describes the deposition of particles (or the growth of a rigid crystal) on a disordered substrate is investigated. The dynamic renormalization group is applied to the stochastic growth equation using the Martin, Sigga, and Rose formalism. The periodic potential and the quenched disorder, upon averaging, are combined into a single term in the generating functional. Changing the temperature (or the inherent noise of the deposition process) two different regimes with a transition between them at $T_{sr}$, are found: for $T>T_{sr}$ this term is irrelevant and the surface has the scaling properties of a surface growing on a flat substrate in the rough phase. The height-height correlations behave as $C(L,\tau)\sim \ln [L f(\tau/L^2)]$. While the linear response mobility is finite in this phase it does vanish as $(T-T_{sr})^{1.78}$ when $T\rightarrow T_{sr}^+$. For $T

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