Diffusional Relaxation in Random Sequential Deposition

Details Diffusional Relaxation in Random Sequential Deposition Diffusional Relaxation in Random Sequential Deposition

1996-10-25

arxiv.org/abs/cond-mat/9610181v1

Physics

Condensed Matter

Statistical Mechanics

9 pages + 2 figures

Scientific paper

10.1088/0305-4470/30/9/003

The effect of diffusional relaxation on the random sequential deposition
process is studied in the limit of fast deposition. Expression for the coverage
as a function of time are analytically derived for both the short-time and
long-time regimes. These results are tested and compared with numerical
simulations.

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