Design, fabrication, and characterization of broadband multilayer mirrors for EUV optics at normal incidence

Physics – Optics

Scientific paper

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Scientific paper

A method of designing multilayers with broadband wavelength responses for use as coatings in EUV optics at normal incidence is presented int his paper. The method is based on the well-known Fresnel equations and recursive calculation combined with a defined merit function, with random variation of the thickness of each layer. This allows the design of multilayers for specific requirements. The method was used to design Mo/Si multilayers with broadband wavelength responses for the EUV region, 18 - 20 nm. Such mirrors were made by magnetron sputtering in 99.99% pure argon. The deposition rates, after calibration, were 0.12 nms-1 for molybdenum and 0.07 nms-1 for silicon. The broadband multilayers were deposited on 30 mm diameter K9 glass substrates with rms surface roughnesses less than 0.8 nm.

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