Dependence of Zinc Oxide Thin Films Properties on Filtered Vacuum Arc Deposition Parameters

Details Dependence of Zinc Oxide Thin Films Properties on Filtered Vacuum Arc Deposition Parameters Dependence of Zinc Oxide Thin Films Properties on Filtered Vacuum Arc Deposition Parameters

2005-01-17

arxiv.org/abs/cond-mat/0501374v1

Physics

Condensed Matter

Materials Science

Scientific paper

10.1088/0022-3727/38/14/017

The micro-properties (structure and composition), and macro-properties
(electrical and optical properties) of zinc oxide (ZnO) thin films deposited on
glass substrates using a filtere vacuum arc deposition (FVAD) system were
investigated as a function of oxygen pressure (0.37 - 0.5 Pa) and arc current
(100 - 300 A). Correlations between the various properties were investigated.

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