Defect-induced shift of the Peierls transition in TTF-TCNQ thin films

Details Defect-induced shift of the Peierls transition in TTF-TCNQ thin films Defect-induced shift of the Peierls transition in TTF-TCNQ thin films

2010-09-10

arxiv.org/abs/1009.2092v1

Physics

Condensed Matter

Materials Science

21 pages, 10 figures, 1 table

Scientific paper

In this paper we investigate the influence of the substrate material and film thickness on the Peierls transition temperature in tetrathiafulvalene-tetracyanoquinodimethane (TTF-TCNQ) thin films, grown by physical vapor deposition. Our analysis shows that the substrate material and the growth conditions strongly influence the film morphology. In particular, we demonstrate that the Peierls transition temperature in thin films is lower than in TTF-TCNQ single crystals. We argue that this effect arises due to defects, which emerge in TTF-TCNQ thin films during the growth process.

Affiliated with

Also associated with

No associations

Rating

Defect-induced shift of the Peierls transition in TTF-TCNQ thin films does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with Defect-induced shift of the Peierls transition in TTF-TCNQ thin films, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Defect-induced shift of the Peierls transition in TTF-TCNQ thin films will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFWR-SCP-O-562274