Decoupling Graphene from SiC(0001) via Oxidation

Details Decoupling Graphene from SiC(0001) via Oxidation Decoupling Graphene from SiC(0001) via Oxidation

2010-03-30

arxiv.org/abs/1003.5702v1

Physics

Condensed Matter

Materials Science

Scientific paper

When epitaxial graphene layers are formed on SiC(0001), the first carbon layer (known as the "buffer layer"), while relatively easy to synthesize, does not have the desirable electrical properties of graphene. The conductivity is poor due to a disruption of the graphene pi-bands by covalent bonding to the SiC substrate. Here we show that it is possible to restore the graphene pi-bands by inserting a thin oxide layer between the buffer layer and SiC substrate using a low temperature, CMOS-compatible process that does not damage the graphene layer.

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