Critical Separation of Clusters During Physical Vapor Deposition

Details Critical Separation of Clusters During Physical Vapor Deposition Critical Separation of Clusters During Physical Vapor Deposition

2011-12-14

arxiv.org/abs/1112.3278v1

Physics

Condensed Matter

Materials Science

Scientific paper

The critical separation of clusters, corresponding to the maximum density of clusters, affects growth characteristics during physical vapor deposition (PVD). In particular, this separation can affect surface smoothness in growing single-crystalline films, grain size distribution in growing polycrystalline films, and diameter in growing nanorods. This Letter reports a theoretical expression of the critical separation as a function of deposition conditions and accompanying verifications using lattice kinetic Monte Carlo (MC) simulations of PVD on Cu{111}. In contrast to existing theories, the theoretical expression in this Letter is (1) closed-form, (2) in better agreement with the MC simulations than the lattice approximation and (3) in better agreement with the MC simulations than the mean field approximation when the critical separation is large- larger than 25 nm for PVD on Cu{111}.

Affiliated with

Also associated with

No associations

Rating

Critical Separation of Clusters During Physical Vapor Deposition does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with Critical Separation of Clusters During Physical Vapor Deposition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Critical Separation of Clusters During Physical Vapor Deposition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFWR-SCP-O-227925