Contacting individual Fe(110) dots in a single electron-beam lithography step

Details Contacting individual Fe(110) dots in a single electron-beam lithography step Contacting individual Fe(110) dots in a single electron-beam lithography step

2009-02-23

arxiv.org/abs/0902.3914v1

Nanotechnology 20 (2009) 285302

Physics

Condensed Matter

Materials Science

5 pages

Scientific paper

10.1088/0957-4484/20/28/285302

We report on a new approach, entirely based on electron-beam lithography technique, to contact electrically, in a four-probe scheme, single nanostructures obtained by self-assembly. In our procedure, nanostructures of interest are localised and contacted in the same fabrication step. This technique has been developed to study the field-induced reversal of an internal component of an asymmetric Bloch domain wall observed in elongated structures such as Fe(110) dots. We have focused on the control, using an external magnetic field, of the magnetisation orientation within N\'eel caps that terminate the domain wall at both interfaces. Preliminary magneto-transport measurements are discussed demonstrating that single Fe(110) dots have been contacted.

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