Conformational rearrangements in thin films of polydimethylsiloxane melt

Details Conformational rearrangements in thin films of polydimethylsiloxane melt Conformational rearrangements in thin films of polydimethylsiloxane melt

2005-10-26

arxiv.org/abs/cond-mat/0510713v1

Polymer 47, 878 (2006)

Physics

Condensed Matter

Soft Condensed Matter

19 pages 3 figures

Scientific paper

10.1016/j.polymer.2005.12.010

Synchrotron X-ray reflectivity (XRR) confirms the formation of a quasi-immobilized layer in thin films of polydimethylsiloxane (PDMS) melts near silica surfaces. This layer (40-60A) has a lower density than the bulk value, and its thickness varies slightly with PDMS molecular weight. Formation of this layer is very rapid for PDMS melts with low molecular weights (below entanglement limit for these molecules) but takes 5-10 hours for higher molecular weights (close to and above their entanglement value).

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