Computer simulation of crystal growth and void formation

Details Computer simulation of crystal growth and void formation Computer simulation of crystal growth and void formation

Jun 2000

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2000aipc..519..575k&link_type=abstract

STATISTICAL PHYSICS: Third Tohwa University International Conference. AIP Conference Proceedings, Volume 519, pp. 575-577 (2000

Physics

1

Theory And Models Of Crystal Growth, Physics Of Crystal Growth, Crystal Morphology, And Orientation, Point Defects And Defect Clusters, Microscopic Defects

Scientific paper

The surface structure and vacancy formation during the growth of thin film have been studied with use of a kinetic Monte Carlo method. By extending Solid-on-Solid model to a model which allows vacancies to form in the film, we investigated both the surface structure and the void structure, and interrelation between them. It is shown that point defects appear in the film when the surface has a layer structure, while large voids consisting of more than one vacant site are formed when the surface becomes rough. The spatial distribution of vacancies is closely related to the surface structure. .

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