Charge state of the O$_{2}$ molecule during silicon oxidation through hybrid functional calculations

Details Charge state of the O$_{2}$ molecule during silicon oxidation through hybrid functional calculations Charge state of the O$_{2}$ molecule during silicon oxidation through hybrid functional calculations

2008-09-29

arxiv.org/abs/0809.4905v1

Phys. Rev. B 78, 161305(R) (2008)

Physics

Condensed Matter

Materials Science

4 pages, 3 figures

Scientific paper

10.1103/PhysRevB.78.161305

We study the charge state of the diffusing O$_2$ molecule during silicon oxidation through hybrid functional calculations. We calculate charge transition levels of O$_2$ in bulk SiO$_2$ and use theoretical band offsets to align these levels with respect to the Si band edges. To overcome the band-gap problem of semilocal density fuctionals, we employ hybrid functionals with both predefined and empirically adjusted mixing coefficients. We find that the charge transition level $\epsilon^{0/-}$ in bulk SiO$_2$ occurs at $\sim$1.1 eV above the silicon conduction band edge, implying that the O$_2$ molecule diffuses through the oxide in the neutral charge state. While interfacial effects concur to lower the charge transition level, our estimates suggest that the neutral charge state persists until silicon oxidation.

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