Behavior of electrons in a dual-magnetron sputter deposition system: a Monte Carlo model

Details Behavior of electrons in a dual-magnetron sputter deposition system: a Monte Carlo model Behavior of electrons in a dual-magnetron sputter deposition system: a Monte Carlo model

Mar 2011

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2011njph...13c3018y&link_type=abstract

New Journal of Physics, Volume 13, Issue 3, pp. 033018 (2011).

Physics

1

Scientific paper

A Monte Carlo model has been developed for investigating the electron behavior in a dual-magnetron sputter deposition system. To describe the three-dimensional (3D) geometry, different reference frames, i.e. a local and a global coordinate system, were used. In this study, the influence of both closed and mirror magnetic field configurations on the plasma properties is investigated. In the case of a closed magnetic field configuration, the calculated electron trajectories show that if an electron is emitted in (or near) the center of the cathode, where the influence of the magnetic field is low, it is able to travel from one magnetron to the other. On the other hand, when an electron is created at the race track area, it is more or less trapped in the strong magnetic field and cannot easily escape to the second magnetron region. In the case of a mirror magnetic field configuration, irrespective of where the electron is emitted from the cathode, it cannot travel from one magnetron to the other because the magnetic field lines guide the electron to the substrate. Moreover, the electron density and electron impact ionization rate have been calculated and studied in detail for both configurations.

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