Band Structure Engineering of Multinary Chalcogenide Topological Insulators

Physics – Condensed Matter – Materials Science

Scientific paper

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

5 pages, 3 figures

Scientific paper

10.1103/PhysRevB.83.245202

Topological insulators (TIs) have been found in strained binary HgTe and ternary I-III-VI2 chalcopyrite compounds such as CuTlSe2 which have inverted band structures. However, the non-trivial band gaps of these existing binary and ternary TIs are limited to small values, usually around 10 meV or less. In this work, we reveal that a large non-trivial band gap requires the material having a large negative crystal field splitting $\Delta_{CF}$ at top of the valence band and a moderately large negative $s-p$ band gap $E_g^{s-p}$. These parameters can be better tuned through chemical ordering in multinary compounds. Based on this understanding, we show that a series of quaternary I2-II-IV-VI4 compounds, including Cu2HgPbSe4, Cu2CdPbSe4, Ag2HgPbSe4 and Ag2CdPbTe4 are TIs, in which Ag2HgPbSe4 has the largest TI band gap of 47 meV because it combines the optimal values of $\Delta_{CF}$ and $E_g^{s-p}$.

No associations

LandOfFree

Say what you really think

Search LandOfFree.com for scientists and scientific papers. Rate them and share your experience with other people.

Rating

Band Structure Engineering of Multinary Chalcogenide Topological Insulators does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with Band Structure Engineering of Multinary Chalcogenide Topological Insulators, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Band Structure Engineering of Multinary Chalcogenide Topological Insulators will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFWR-SCP-O-131722

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.