Band offset determination of the GaAs/GaAsN interface using the DFT method

Details Band offset determination of the GaAs/GaAsN interface using the DFT method Band offset determination of the GaAs/GaAsN interface using the DFT method

2008-03-17

arxiv.org/abs/0803.2458v1

J. Phys.: Condens. Matter 20 (2008) 315004

Physics

Condensed Matter

Materials Science

Scientific paper

10.1088/0953-8984/20/31/315004

The GaAs/GaAsN interface band offset is calculated from first principles. The electrostatic potential at the core regions of the atoms is used to estimate the interface potential and align the band structures obtained from respective bulk calculations. First, it is shown that the present method performs well on the well-known conventional/conventional AlAs/GaAs (001) superlattice system. Then the method is applied to a more challenging nonconventional/conventional GaAsN/GaAs (001) system, and consequently type I band lineup and valence-band offset of about 35 meV is obtained for nitrogen concentration of about 3 %, in agreement with the recent experiments. We also investigate the effect of strain on the band lineup. For the GaAsN layer longitudinally strained to the GaAs lattice constant, the type II lineup with a nearly vanishing band offset is found, suggesting that the anisotropic strain along the interface is the principal cause for the often observed type I lineup.

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