Applications of the MRI-model in sputter depth profiling

Details Applications of the MRI-model in sputter depth profiling Applications of the MRI-model in sputter depth profiling

1998-07-03

arxiv.org/abs/cond-mat/9807053v1

J.of Surface Analysis 4 (1998) 9-13

Physics

Condensed Matter

Materials Science

5 pages postscript

Scientific paper

The physical principles of the MRI model (abbreviation for mixing-roughness- information depth) for the theoretical calculation of measured concentration- depth profiles obtained in sputter depth profiling with AES, XPS, SIMS, etc. are outlined. The main features of the calculation and the respective visual Basic program are explained. Examples demonstrate the usefulness of the current approach for the reconstruction of the original in-depth distribution of composition.

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