Analytical Study of Thermal Annealing Behaviour of Erbium Emission in Er2O3-Sol-Gel Silica Films

Physics – Condensed Matter – Materials Science

Scientific paper

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

11 pages, 3 figures

Scientific paper

10.1088/0022-3727/44/31/315401

Room-temperature 1535-nm-band photoluminescence in ~126 nm silica films (6 at. % doping), produced by spin-coating an Er2O3 and tetraethylorthosilicate sol-gel formulation on silicon substrates, was studied as a function of vacuum furnace annealing (500 to 1050 degrees C). Emission is strongly enhanced for annealing near 850 degrees C, which is shown by modeling the temperature dependence as arising from thermally-activated removal of hydroxyl ions. Suitability of such a process for silicon-based applications is discussed.

No associations

LandOfFree

Say what you really think

Search LandOfFree.com for scientists and scientific papers. Rate them and share your experience with other people.

Rating

Analytical Study of Thermal Annealing Behaviour of Erbium Emission in Er2O3-Sol-Gel Silica Films does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with Analytical Study of Thermal Annealing Behaviour of Erbium Emission in Er2O3-Sol-Gel Silica Films, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Analytical Study of Thermal Annealing Behaviour of Erbium Emission in Er2O3-Sol-Gel Silica Films will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFWR-SCP-O-3921

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.