Analysis of Substructure Parameters in Different Texture Components and Structure-Formation in Magnetron Sputtered TiN Coatings

Details Analysis of Substructure Parameters in Different Texture Components and Structure-Formation in Magnetron Sputtered TiN Coatings Analysis of Substructure Parameters in Different Texture Components and Structure-Formation in Magnetron Sputtered TiN Coatings

Apr 2007

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2007aipc..899..632i&link_type=abstract

SIXTH INTERNATIONAL CONFERENCE OF THE BALKAN PHYSICAL UNION. AIP Conference Proceedings, Volume 899, pp. 632-632 (2007).

Physics

Structure And Morphology, Thickness, Crystalline Orientation And Texture, Deposition By Sputtering

Scientific paper

The substructure parameters in the main texture components and
structure-formation process during the growth of 500nm and 4000nm
reactive CFUBMS TiN deposits as a function of the continuous target
current (DC).

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