Analysis of Ni-HYDRIDE Thin Film after Surface Plasmon Generation by Laser Technique

Details Analysis of Ni-HYDRIDE Thin Film after Surface Plasmon Generation by Laser Technique Analysis of Ni-HYDRIDE Thin Film after Surface Plasmon Generation by Laser Technique

Dec 2005

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2005cmns.conf..421v&link_type=abstract

CONDENSED MATTER NUCLEAR SCIENCE. Proceedings of the 10th International Conference on Cold Fusion. Held 24-29 August 2003 in Roy

Physics

Condensed Matter

Scientific paper

A nickel hydride thin film was studied by the attenuated total reflection method. The differences in behavior between a "black" film, and a pure nickel film "blank," are shown. The black nickel hydride film has been obtained by a short electrolysis with 1 M Li2SO4 electrolyte in light water, A shift in the minimum of the observed reflected light occurs, together with a change in the minimum shape (i.e. its half-height width increases). These two phenomenon are due to the change in the electronic band structure of the metal induced by electrons added to the lattice by hydrogen. The change of the electronic structure, revealed by the laser coupling conditions, leads us to consider that a hydride phase was created. Both the blank (not hydrogenated) and black (hydrogenated) specimens were taken under He-Ne laser beam at the reflectance minimum angle for about three hours. A SIMS analysis was also implemented to reveal differences in the isotopic composition of Cu, as marker element between the blank and black films, in order to study the coupled effect of electrolysis and plasmon-polariton excitation on LENR processes in condensed matter.

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