An improved kinetic Monte Carlo approach for epitaxial submonolayer growth

Details An improved kinetic Monte Carlo approach for epitaxial submonolayer growth An improved kinetic Monte Carlo approach for epitaxial submonolayer growth

2007-07-05

arxiv.org/abs/0707.0715v1

Physics

Condensed Matter

Soft Condensed Matter

12 pages, 6 figures

Scientific paper

Two-component submonolayer growth on triangular lattice is qualitatively studied by kinetic Monte Carlo techniques. The hopping barrier governing surface diffusion of the atoms is estimated with an improved formula and using realistic pair interaction potentials. Realistic degrees of freedoms enhancing the surface diffusion of atoms are also introduced. The main advantages of the presented technique are the reduced number of free parameters and the clear diffusion activated mechanism for the segregation of different types of atoms. The potential of this method is exemplified by reproducing (i) vacancy and stacking fault related phase-boundary creation and dynamics; (ii) a special co-deposition and segregation process where the segregated atoms of the second component surrounds the islands formed by the first type of atoms.

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