Amorphous thin film growth: theory compared with experiment

Details Amorphous thin film growth: theory compared with experiment Amorphous thin film growth: theory compared with experiment

1999-12-14

arxiv.org/abs/cond-mat/9912249v3

Physics

Condensed Matter

7 pages including 5 figures

Scientific paper

10.1209/epl/i2000-00235-7

Experimental results on amorphous ZrAlCu thin film growth and the dynamics of the surface morphology as predicted from a minimal nonlinear stochastic deposition equation are analysed and compared. Key points of this study are (i) an estimation procedure for coefficients entering into the growth equation and (ii) a detailed analysis and interpretation of the time evolution of the correlation length and the surface roughness. The results corroborate the usefulness of the deposition equation as a tool for studying amorphous growth processes.

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