A unified treatment of current-induced instabilities on Si surfaces

Details A unified treatment of current-induced instabilities on Si surfaces A unified treatment of current-induced instabilities on Si surfaces

2004-03-19

arxiv.org/abs/cond-mat/0403488v1

Physics

Condensed Matter

Soft Condensed Matter

4 pages, 1 figure. Submitted to Phys. Rev. Lett

Scientific paper

10.1103/PhysRevB.70.161303

We introduce a simple two region model where the diffusion constant in a small region around each step on a vicinal surface can differ from that found on the terraces. Steady state results for this model provide a physically suggestive mapping onto kinetic coefficients in the conventional sharp-step model, with a negative coefficient arising from faster diffusion in the step region. A linear stability analysis of the resulting sharp-step model provides a unified and simple interpretation of many experimental results for current-induced step bunching and wandering instabilities on both Si(111) and Si(001) surfaces.

Affiliated with

Also associated with

No associations

Rating

A unified treatment of current-induced instabilities on Si surfaces does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with A unified treatment of current-induced instabilities on Si surfaces, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and A unified treatment of current-induced instabilities on Si surfaces will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFWR-SCP-O-335918