A Practical Guide for X-Ray Diffraction Characterization of Ga(Al, In)N Alloys

Details A Practical Guide for X-Ray Diffraction Characterization of Ga(Al, In)N Alloys A Practical Guide for X-Ray Diffraction Characterization of Ga(Al, In)N Alloys

2005-10-07

arxiv.org/abs/cond-mat/0510174v1

CHIN.PHYS.LETT. Vol. 22, No. 8 (2005) 1984

Physics

Condensed Matter

Materials Science

9 pages, 5 figures

Scientific paper

10.1088/0256-307X/22/8/045

Ga(In, Al)N alloys are used as an active layer or cladding layer in light emitting diodes and laser diodes. x-ray diffraction is extensively used to evaluate the crystalline quality, the chemical composition and the residual strain in Ga(Al,In)N thin films, which directly determine the emission wavelength and the device performance. Due to the minor mismatch in lattice parameters between Ga(Al, In)N alloy and a GaN virtual substrate, x-ray diffraction comes to a problem to separate the signal from Ga(Al,In)N alloy and GaN. We give a detailed comparison on different diffraction planes. In order to balance the intensity and peak separation between Ga(Al,In)N alloy and GaN, (0004) and (1015) planes make the best choice for symmetric scan and asymmetric scan, respectively.

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