A Diagnostic Study of Plasma CVD Under Microgravity and its Application to Diamond Deposition

Details A Diagnostic Study of Plasma CVD Under Microgravity and its Application to Diamond Deposition A Diagnostic Study of Plasma CVD Under Microgravity and its Application to Diamond Deposition

Jan 1999

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1999adspr..24.1219i&link_type=abstract

Advances in Space Research, Volume 24, Issue 10, p. 1219-1223.

Physics

Scientific paper

Diamond thin-film was synthesized under microgravity using Japanese free-flyer (SFU, Space Flyer Unit) launched in March 1995. This program achieved the space-based production of diamond by Chemical Vapor Deposition (CVD). The DC plasma excitation method was applied to hydrogen-methane mixed gas within the pressure range of 2.66 ~ 6.55 × 103Pa. Remarkable differences of the electron temperature of hydrogen plasma were confirmed between the microgravity and the on-ground experiments. The intensity ratio of CH/Hα measured by emission spectroscopy was found as a sensitve indicator of gravity effects on gaseous chemistry and diamond quality

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