Measurement of Local Reactive and Resistive Photoresponse of a Superconducting Microwave Device

Details Measurement of Local Reactive and Resistive Photoresponse of a Superconducting Microwave Device Measurement of Local Reactive and Resistive Photoresponse of a Superconducting Microwave Device

2005-12-22

arxiv.org/abs/cond-mat/0512572v1

Appl. Phys. Lett. 88, 212503 (2006)

Physics

Condensed Matter

Superconductivity

4 pages, 4 figures, submitted to Applied Physics Letters

Scientific paper

10.1063/1.2205726

We propose and demonstrate a spatial partition method for the high-frequency photo-response of superconducting devices correlated with inductive and resistive changes in microwave impedance. Using a laser scanning microscope, we show that resistive losses are mainly produced by local defects at microstrip edges and by intergrain weak links in the high-temperature superconducting material. These defects initiate nonlinear high-frequency response due to overcritical current densities and entry of vortices.

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