Thermionic Emission as a tool to study transport in undoped nFinFETs

Details Thermionic Emission as a tool to study transport in undoped nFinFETs Thermionic Emission as a tool to study transport in undoped nFinFETs

2010-03-29

arxiv.org/abs/1003.5441v1

IEEE Electron Device Letters 21 (2010) 150

Physics

Condensed Matter

Mesoscale and Nanoscale Physics

3 pages, 3 figure, 1 table

Scientific paper

10.1109/LED.2009.2036134

Thermally activated sub-threshold transport has been investigated in undoped triple gate MOSFETs. The evolution of the barrier height and of the active cross-section area of the channel as a function of gate voltage has been determined. The results of our experiments and of the Tight Binding simulations we have developed are both in good agreement with previous analytical calculations, confirming the validity of thermionic approach to investigate transport in FETs. This method provides an important tool for the improvement of devices characteristics.

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