Anomalous diffusion mediated by atom deposition into a porous substrate

Details Anomalous diffusion mediated by atom deposition into a porous substrate Anomalous diffusion mediated by atom deposition into a porous substrate

2009-02-16

arxiv.org/abs/0902.2618v1

Physical Review Letters 102 (2009) 045901

Physics

Condensed Matter

Statistical Mechanics

4 pages

Scientific paper

10.1103/PhysRevLett.102.045901

Constant flux atom deposition into a porous medium is shown to generate a dense overlayer and a diffusion profile. Scaling analysis shows that the overlayer acts as a dynamic control for atomic diffusion in the porous substrate. This is modeled by generalizing the porous diffusion equation with a time-dependent diffusion coefficient equivalent to a nonlinear rescaling of time

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