New cellular automaton designed to simulate epitaxial films growth

Details New cellular automaton designed to simulate epitaxial films growth New cellular automaton designed to simulate epitaxial films growth

2004-06-28

arxiv.org/abs/cond-mat/0406677v1

Physica A345 (2005) 538

Physics

Condensed Matter

Materials Science

10 pages, elsart, 5 figures in 20 files

Scientific paper

10.1016/j.physa.2004.08.013

In this paper a simple (2+1) solid-on-solid model of the epitaxial films growth based on random deposition followed by breaking particle-particle lateral bonds and particles surface diffusion is introduced. The influence of the critical number of the particle-particle lateral bonds $z$ and the deposition rate on the surface roughness dynamics and possible surface morphology anisotropy is presented. The roughness exponent $\alpha$ and the growth exponent $\beta$ are $(0.863,0.357)$, $(0.215,0.123)$, $(0.101,0.0405)$ and $(0.0718,0.0228)$ for $z=1$, 2, 3 and 4, respectively. Snapshots from simulations of the growth process are included.

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