Effects of off-axis illumination and scattering-bar optical proximity correction on the impact of lens aberration on 130-nm polygate mask: a simulation study

Details Effects of off-axis illumination and scattering-bar optical proximity correction on the impact of lens aberration on 130-nm polygate mask: a simulation study Effects of off-axis illumination and scattering-bar optical proximity correction on the impact of lens aberration on 130-nm polygate mask: a simulation study

Jul 2000

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2000spie.4000.1070n&link_type=abstract

Proc. SPIE Vol. 4000, p. 1070-1078, Optical Microlithography XIII, Christopher J. Progler; Ed.

Computer Science

Performance

Scientific paper

A simulation study has been performed to look at improving the imaging of a 130nm poly gate mask design. For this lithography process, we have chosen 6 percent attenuated PSM applied with scattering-bar optical proximity correction (SB-OPC) using 248 nm exposure wavelength. We compare the process window performance of off-axis illuminations (OAI) such as QUASAR and annular to a conventional on-axis illumination. Sampled lens aberrations were introduced to the simulation model to evaluate the impact of illumination settings. Simulations show benefits of combining SB-OPC technology with OAI on the performance of 130nm poly gate line features in the presence of known lens aberrations. For this simulation study, we have used our WaveMaster software tool to automate the SOLID-C simulation loops that includes multiple pre-selected line features form an actual poly gate mask design, five different lens aberration Zernike data sets, and three illumination settings.

Affiliated with

Also associated with

No associations

Rating

Effects of off-axis illumination and scattering-bar optical proximity correction on the impact of lens aberration on 130-nm polygate mask: a simulation study does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with Effects of off-axis illumination and scattering-bar optical proximity correction on the impact of lens aberration on 130-nm polygate mask: a simulation study, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Effects of off-axis illumination and scattering-bar optical proximity correction on the impact of lens aberration on 130-nm polygate mask: a simulation study will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFWR-SCP-O-1480262