The energy scale behind the metallic behaviors in low-density Si-MOSFETs

Physics – Condensed Matter – Strongly Correlated Electrons

Scientific paper

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

two references added, corrected typos, minor changes, final version as published

Scientific paper

We show that the unexpected metallic behavior (the so-called two-dimensional metal-insulator transition) observed in low-density Silicon metal-oxide-semiconductor field-effect transistors (Si-MOSFETs) is controlled by a unique characteristic energy scale, the polarization energy. On one hand, we perform Quantum Monte Carlo calculations of the energy needed to polarize the two dimensional electron gas at zero temperature, taking into account Coulomb interactions, valley degeneracy and electronic mobility (disorder). On the other hand, we identify the characteristic energy scale controlling the physics in eight different sets of experiments. We find that our {\it ab-initio} polarization energies (obtained without any adjustable parameters) are in perfect agreement with the observed characteristic energies for all available data, both for the magnetic field and temperature dependence of the resistivities. Our results put strong constraints on possible mechanisms responsible for the metallic behavior. In particular, there are strong indications that the system would eventually become insulating at low enough temperature.

No associations

LandOfFree

Say what you really think

Search LandOfFree.com for scientists and scientific papers. Rate them and share your experience with other people.

Rating

The energy scale behind the metallic behaviors in low-density Si-MOSFETs does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with The energy scale behind the metallic behaviors in low-density Si-MOSFETs, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and The energy scale behind the metallic behaviors in low-density Si-MOSFETs will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFWR-SCP-O-128675

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.