Influence of the vacuum interface on the charge distribution in V2O3 thin films

Details Influence of the vacuum interface on the charge distribution in V2O3 thin films Influence of the vacuum interface on the charge distribution in V2O3 thin films

2009-09-07

arxiv.org/abs/0909.1335v1

New J. Phys. 11, 093034 (2009)

Physics

Condensed Matter

Strongly Correlated Electrons

6 pages, 13 figures, more information at http://www.physik.uni-augsburg.de/~eyert/

Scientific paper

10.1088/1367-2630/11/9/093034

The electronic structure of V2O3 thin films is studied by means of the augmented spherical wave method as based on density functional theory and the local density approximation. We establish that effects of charge redistribution, induced by the vacuum interface, in such films are restricted to a very narrow surface layer of approx. 15 Angstroem thickness. As a consequence, charge redistribution can be ruled out as a source of the extraordinary thickness-dependence of the metal-insulator transition observed in V2O3 thin films of 100-1000 Angstroem thickness.

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