Computer Science – Performance
Scientific paper
May 2005
adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2005spie.5754.1405w&link_type=abstract
Optical Microlithography XVIII. Edited by Smith, Bruce W. Proceedings of the SPIE, Volume 5754, pp. 1405-1416 (2005).
Computer Science
Performance
Scientific paper
The greatest challenge for 65-nm contact holes and via printing is ensuring an acceptable process window (250-nm DoF @ 8% EL) for a wide range of pitches with a MEEF lower than 3.5. To print dense contact holes / vias with a CD less than 100-nm, very high Numerical Apertures (>= 0.85) are required. Consequently DoF through pitch is dramatically reduced, such that it becomes absolutely necessary to develop new techniques to enhance process latitude. In this paper, we will study the use of customized illuminations formed by combination of small radius conventional illumination and quasar. Generically, this type of illumination is commonly referred to as 5-pole illumination. Specifically this paper, the "windmill" and "soft quasar" options are investigated. These designs are based upon the assumption, that there is a way to optimize for all pitches, the imaging lens pupil filling with diffracted orders. Using a combination of aerial image simulations and experimental (double) exposures, the optimal 5-pole illumination designs are derived, with their simulated performance being compared to conventional illumination settings. For the optimised designs, experimental data is presented for "real" device structures based on the Crolles2 65-nm technology design rules.
Conley Will
Depre Jerome
Warrick Scott
Weisbuch Francois
No associations
LandOfFree
Assessment of 5-pole illumination for 65nm-node contact holes does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.
If you have personal experience with Assessment of 5-pole illumination for 65nm-node contact holes, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Assessment of 5-pole illumination for 65nm-node contact holes will most certainly appreciate the feedback.
Profile ID: LFWR-SCP-O-1378832