Occurrence of volatile nitrides from silicates in low pressure, high temperature, reducing environments

Details Occurrence of volatile nitrides from silicates in low pressure, high temperature, reducing environments Occurrence of volatile nitrides from silicates in low pressure, high temperature, reducing environments

Nov 1973

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1973gecoa..37.2523m&link_type=abstract

Geochimica et Cosmochimica Acta, vol. 37, Issue 11, pp.2523-2528

Physics

1

Scientific paper

A nitride and oxynitride of silicon, Si 2 N and Si 2 NO, have been observed as stable vapor species over quartz in reducing atmospheres at temperatures as low as 1400°C. Partial pressures of species in the reaction, SiO + Si 2 N = Si 2 NO + Si were measured over the temperature range 1400-1525°C by molecular-beam mass spectrometry. It is suggested that vaporization through formation of volatile nitride-nitrogen species may be an important mechanism for the transfer of nitrogen from silicates in reducing environments.

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