Entangled-State Lithography: Tailoring any Pattern with a Single State

Details Entangled-State Lithography: Tailoring any Pattern with a Single State Entangled-State Lithography: Tailoring any Pattern with a Single State

2000-11-17

arxiv.org/abs/quant-ph/0011075v1

Phys.Rev.Lett. 86 (2001) 4516-4519

Physics

Quantum Physics

4 pages, 4 figures

Scientific paper

10.1103/PhysRevLett.86.4516

We demonstrate a systematic approach to Heisenberg-limited lithographic image
formation using four-mode reciprocal binominal states. By controlling the
exposure pattern with a simple bank of birefringent plates, any pixel pattern
on a $(N+1) \times (N+1)$ grid, occupying a square with the side half a
wavelength long, can be generated from a $2 N$-photon state.

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