Silicon carbide for mirrors by plasma enhanced chemical vapour deposition at low temperature

Physics – Optics

Scientific paper

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Space Optics, Mirrors

Scientific paper

A new technology is under development to grow layers of amorphous Silicon Carbide in vacuum at temperatures below 200°C by PE-CVD technology. The layers can be used either to improve the surface quality of mirror substrates, as a polishable cladding coating, or to form self-sustaining thin mirrors in SiC. The former application is useful in particular for the coating of some varieties of SiC materials that are not well polishable or that have high residual porosity, thus obtaining good CTE matching with the substrates. The latter application is very promising to get ultra-thin mirrors by replica, by growing layers of some tenths of millimetre on an optically polished master. The paper presents the preliminary results obtained with the two mentioned possible uses of the PE-CVD SiC process.

No associations

LandOfFree

Say what you really think

Search LandOfFree.com for scientists and scientific papers. Rate them and share your experience with other people.

Rating

Silicon carbide for mirrors by plasma enhanced chemical vapour deposition at low temperature does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.

If you have personal experience with Silicon carbide for mirrors by plasma enhanced chemical vapour deposition at low temperature, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Silicon carbide for mirrors by plasma enhanced chemical vapour deposition at low temperature will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFWR-SCP-O-893045

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.