New micro-lithography techniques for the manufacture of wavefront sensors for the FALCON concept: ADONF

Details New micro-lithography techniques for the manufacture of wavefront sensors for the FALCON concept: ADONF New micro-lithography techniques for the manufacture of wavefront sensors for the FALCON concept: ADONF

Jul 2006

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2006spie.6272e.140c&link_type=abstract

Advances in Adaptive Optics II. Edited by Ellerbroek, Brent L.; Bonaccini Calia, Domenico. Proceedings of the SPIE, Volume 6272

Physics

Optics

Scientific paper

FALCON is an original concept for next generation instrumentation at ESO VLT or at future ELTs. It is a multi-objects integral field spectrograph with multiple integral field units (IFU) performing adaptive optics correction in order to reach spatial and spectral resolution ideally suited for distant galaxy studies. The resolutions required for the VLT are typically 0.15 - 0.25 arcsec and R>=5000 in the 0.8-1.8 μm wavelength range. The studied galaxies are very faint objects that cannot be directly used to perform wavefront sensing. Thus, we use at least three Wave-Front Sensors (WFS) per IFU to sense the wavefront of stars located around the galaxy, and the on-axis wavefront from the galaxy will be deduced from the off-axis measurements by atmospheric tomography, and then corrected thanks to an adaptive optics (AO) system within each IFU. Since the WFS is ideally located directly in the focal plane of the telescope, this implies to develop miniaturized devices for the wavefront sensing. Our approach is based on a Shack Hartmann principle and - instead of using a bulky detector behind - we plan to use a miniaturized system including fibers able to transport the light from the focal plane of the microlens array towards a place where the bulk issue is less critical. We draw up the main specifications of this miniaturized system and we present the characteristics of elements manufactured by using new microlithography techniques.

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