Effect of g-line filter transmission characteristics on dose matching between monochromatic exposure tools in a production environment

Details Effect of g-line filter transmission characteristics on dose matching between monochromatic exposure tools in a production environment Effect of g-line filter transmission characteristics on dose matching between monochromatic exposure tools in a production environment

Aug 1993

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1993spie.1927..794p&link_type=abstract

Proc. SPIE Vol. 1927, p. 794-805, Optical/Laser Microlithography VI, John D. Cuthbert; Ed.

Physics

Scientific paper

To maintain critical dimension control in a production environment, it is essential that all wafer steppers have their effective doses matched. Because high pressure Mercury illumination sources actually have a bandwidth of 10 nm and typical resist absorbance curves are dropping steeply around the 436 nm region, differences between G-line filters can cause exposure shifts between steppers. Functional exposure differences on dose to clear wafers of 9% are explained by combining integrator and G-line filter spectrophotometer tests on ten .54 NA wafer steppers.

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