Optimization of layered synthetic microstructures for broadband reflectivity at soft X-ray and EUV wavelengths

Details Optimization of layered synthetic microstructures for broadband reflectivity at soft X-ray and EUV wavelengths Optimization of layered synthetic microstructures for broadband reflectivity at soft X-ray and EUV wavelengths

Mar 1987

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1987apopt..26..990m&link_type=abstract

Applied Optics (ISSN 0003-6935), vol. 26, March 15, 1987, p. 990-994.

Physics

Optics

6

Extraterrestrial Radiation, Laminates, Metal Films, Microstructure, Radiation Effects, Spectral Sensitivity, Broadband, Extreme Ultraviolet Radiation, Film Thickness, Reflectance, X Ray Irradiation

Scientific paper

A technique for optimizing the structure of layered synthetic microstructures (LSMs) to obtain maximum overall reflectivity of LSM-covered optical surfaces over a broad waveband (including soft X-ray and EUV wavelengths) is described. Calculations were performed for variations of the total number of layers for Ir-Si and Pt-Si combinations of materials in order to find a satisfactory compromise between increasing the LSM reflectivity and reducing its complexity. The optimum thicknesses of the Ir-Si and Pt-Si LSM optimized for 300-600 A and 100-300 A bands, respectively, for several angles of incidence are presented together with the respective reflectivity curves.

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