Low-temperature crystallization of thin silicate layer on crystalline Fe dust

Details Low-temperature crystallization of thin silicate layer on crystalline Fe dust Low-temperature crystallization of thin silicate layer on crystalline Fe dust

Jan 2010

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=2010ep%26s...62...29k&link_type=abstract

Earth, Planets and Space, Volume 62, Issue 1, p. 29-31.

Physics

Scientific paper

The crystallization of an amorphous SiO layer covering Fe crystal grains has been clarified by high-resolution transmission electron microscopic (HRTEM) observation. Cristobalite crystals were produced preferentially on the (110) surface of Fe particles by the oxidation of silicon crystallites in the SiO layer, i.e. the oxidation energy of the silicon crystallites resulted in the epitaxial growth of the oxide layer on the Fe surface. The chemical reaction energy due to the oxidation of silicon crystallites in the SiO layer was concentrated at the interface of the crystal and the amorphous layer. Crystal growth took place from the Fe grain surface.

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