Physics – Optics
Scientific paper
Jul 1996
adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1996spie.2805..212b&link_type=abstract
Proc. SPIE Vol. 2805, p. 212-221, Multilayer and Grazing Incidence X-Ray/EUV Optics III, Richard B. Hoover; Arthur B. Walker; Ed
Physics
Optics
1
Scientific paper
Soft x-ray optics based on slumped, profiled microchannel plates (MCPs) are under development. Their purpose is to collimate the expanding beam from a laser-plasma x-ray source, resulting in a parallel beam suitable for lithography of semiconductor devices. We present a prototype design for such an optic with a radius of curvature optimized for maximum beam intensity. The plate thickness (and hence the channel length) is varied as a function of distance from the plate center. The resulting plate profile is determined by the radius of curvature but not by the x- ray energy. This design is shown by Monte Carlo ray-trace modeling to give a circular illuminated field with a diameter of 36mm for 1 keV x-rays. The calculated intensity of the beam is equivalent to that of the divergence beam at a distance of 0.35m from the source. We also present preliminary x-ray measurements from the optic. These optics, while designed with the semiconductor industry in mind, may find application in any field where a uniform or parallel soft x-ray or VUV beam is required.
Brunton Adam N.
Feller Bruce W.
Fraser George W.
Lees John E.
Tremsin Anton S.
No associations
LandOfFree
MCP-based x-ray collimators for lithography of semiconductor devices does not yet have a rating. At this time, there are no reviews or comments for this scientific paper.
If you have personal experience with MCP-based x-ray collimators for lithography of semiconductor devices, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and MCP-based x-ray collimators for lithography of semiconductor devices will most certainly appreciate the feedback.
Profile ID: LFWR-SCP-O-1384336