Design and analysis of a Schwarzschild imaging multilayer X-ray microscope

Details Design and analysis of a Schwarzschild imaging multilayer X-ray microscope Design and analysis of a Schwarzschild imaging multilayer X-ray microscope

Jul 1990

adsabs.harvard.edu/cgi-bin/nph-data_query?bibcode=1990opten..29..721s&link_type=abstract

Optical Engineering (ISSN 0091-3286), vol. 29, July 1990, p. 721-727.

Physics

Optics

7

High Resolution, Imaging Techniques, Laminates, Systems Engineering, X Ray Imagery, Diffraction Radiation, Microscopes, Mirrors, Spatial Resolution, Spectral Reflectance, X Ray Telescopes

Scientific paper

Several Schwarzschild X-ray microscope optics were designed. Diffraction analysis indicates that better than 600 A spatial resolution in the object plane up to a 0.7 mm field of view can be achieved with 100 A radiation. Currently, a 20 x normal incidence multilayer X-ray microscope of 1.35 m overall length is being fabricated. Other microscope systems for use in conjunction with X-ray telescopes were also analyzed and designed. This paper reports on the results of these studies and the X-ray microscope fabrication effort.

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